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Full Record Details
Persistent URL
http://purl.org/net/epubs/work/36662
Record Status
Checked
Record Id
36662
Title
Chemical interface analysis of as grown HfO2 ultrathin films on SiO2
Contributors
C Maunoury (CEA-LETI)
,
K Dabertrand (ST Microelectronics)
,
E Martinez (CEA-LETI)
,
M Saadoune (CEA-LETI)
,
D Lafond (CEA-LETI)
,
F Pierre (CEA-LETI)
,
S Lhostis (ST Microelectronics)
,
P Bailey (CCLRC Daresbury Lab.)
,
TCQ Noakes (CCLRC Daresbury Lab.)
,
D Jalabert ( CEA-DRFMC)
Abstract
The quality of the interface between a HfO2 high-k gate dielectric and the Si substrate directly influences its electrical properties. The chemical composition of the interfacial region of HfO2 deposited on a SiO2/Si(100) substrate by pulsed liquid injection metal organic chemical vapor deposition at 430 and 550 °C was investigated by medium energy ion scattering, angular resolved x-ray photoemission spectroscopy analysis, and high resolution transmission electron microscopy. It is shown that the HfO2/SiO2 interface is abrupt with low roughness and no silicate. The interface roughness with SiO2 is found to be close to that generally measured in silicon technology (silicon oxide above silicon substrates) [E. A. Irene, Solid-State Electron., 45, 1207 (2001)]. The analysis of the experimental results indicates that the deposition technique does not lead to the formation of an extended silicate layer at the HfO2/SiO2 interface.
Organisation
CCLRC
,
MEIS
Keywords
Materials
Funding Information
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Language
English (EN)
Type
Details
URI(s)
Local file(s)
Year
Journal Article
J Appl Phys
101 (2007): 034112, 1-6.
doi:10.1063/1.2435061
2007
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