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Persistent URL http://purl.org/net/epubs/work/45428649
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Record Id 45428649
Title Simulation of sputtering from an isolated conductor surrounded by a dielectric during plasma etching
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Abstract
Organisation CI
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Funding Information RFBR (14-08-00143); NRNU MEPhI
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Language English (EN)
Type Details URI(s) Local file(s) Year
Journal Article Vacuum 165 (2019): 262-265. doi:10.1016/j.vacuum.2019.04.021 2019