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Persistent URL	http://purl.org/net/epubs/work/54616
Record Status	Checked
Record Id	54616
Title	A new chemically amplified resist for high resolution patterning by E-beam lithography
Contributors	B Lu (STFC Rutherford Appleton Lab.), Y Chen (STFC Rutherford Appleton Lab.), E Huq (STFC Rutherford Appleton Lab.), X Qu, R Liu
Abstract
Organisation	EID , STFC
Keywords	UV1116 , Electron Beam Lithography , Contrast , Sensitivity , High Resolution Patterning
Funding Information
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Licence Information:
Language	English (EN)

Type	Details	URI(s)	Local file(s)	Year
Journal Article	Journal of Nanoscience and Nanotechnology 10, no. 11, Sp. Iss. SI (2010): 7130-7133.	doi:10.1166/jnn.2010.2846		2010